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Project title:


Interface control mechanisms for the simultaneous adsorption ofarsenic and phosphorus onto Mn-oxide-containing binary oxides

Project leader:


Wu Kun


Adsorption technology is one of the most effective methods for removing arsenic (As) from groundwater. However, the poor performance for the removal of As (especially arsenite [As(III)]) under the combined pollution conditions of As and phosphate (P) is a difficult problem in the application of adsorption technology. In this study, we will prepare several kinds of Mn-oxide-containing binary oxides (MOCBOs) through an oxidation-coprecipitation process, and use as adsorbents for the removal of As(III)/As(V) and P simultaneously. This research will concentrate on the various micro-interface reaction processes, including the oxidation-adsorption process of As(III) and the competitive adsorption process of As and P. We will make efforts to analyze the functions and the transformation of the active sites on the surfaces of MOCBOs during these reaction processes, and then modify the chemical constitutions of these adsorbents for better As/P removal performances. Afterwards, we will try to elucidate the dynamic processes involved in the removal of As(III)/As(V) and P at the composite interfaces, which could exhibit the capacities for both oxidation and adsorption. Several surface characterization methods, such as in-situ Fourier Transform Infrared Spectrometer (FTIR), in-situ Raman spectra, X-ray photoelectron spectroscopy (XPS) etc., will be performed to elucidate the changes in the surface properties of these adsorbents before and after the reactions with As(III)/As(V) and P. Additionally, we will explain the competitive adsorption mechanisms for As(III)/As(V) and P, together with the effects of As transformation involved in the competitive adsorption processes. Finally, the technological principle for the simultaneous removal of As and P could be proposed according to the aforementioned results, which will provide scientific evidences and a theoretical basis for the effective control of multifunctional materials to enhance As removal under the combined pollution of As and P.